Perfluoroalkylsulfonyl Compounds

Perfluoroalkylsulfonyl compounds, manufactured using electrochemical fluorination techniques, have several unique features such as low surface tension and high chemical and thermal stability. They are widely used as a photo-resistant component in semiconductors, surfactants, anti-static agents, and various kinds of additives. Eco-friendly perfluoroalkylsulfonyl compounds are designed with a view to minimizing the environmental impact while still maintaining their unique features. It is expected that they will be applied in a wide variety of advanced uses as newly developed products for the next generation.

■Main features

Super strong acid (Super acid) High chemical stability
High thermal stability Non-PFOS structure

■Super strong acid (Super acid)

As organic super strong acids (or their salts) derived from their structures of perfluoroalkylsulfonyl group, they are suitable for photo acid generators in photoresist. It is expected that semiconductor-processing technology will be developed for the next generation (photolithography). Meanwhile, they are also valuable as strong acid catalysts in organic synthesis.

■High chemical stability

Even under the severe-use conditions of a strong acid or a strong base, they are stable and demonstrate their unique features such as low surface tension.

■High thermal stability

Since these salts do not decompose under high temperatures of 250 to 300℃, they can be used as additives for resin molding or in modification processes.

■Non-PFOS structure

This does not include the PFOS (C8F17SO2-; Perfluoroalkylsulfonyl) structure, which has been identified to have the potential to accumulate in the environment and in human bodies.

■Product information

Product name Chemical formula Chemical name Morecular weight Appearance Physical properties
EF-11 CF3SO3H Trifluorometanesulfonic acid
(Triflic acid)
150.07 Colorless liquid bp:162℃
EF-15 CF3SO3Li Lithium trifluoromethanesulfonate (Lithium triflate) 156.01 White powder mp:423℃
EF-18 (CF3SO2)2O Trifluoromethanesulfonic anhydride (Triflic anhydride) 282.13 Colorless liquid bp:84℃
FBSA C4F9SO3H Nonafluorobutanesulfonic acid 300.10 Colorless liquid bp:210-212℃
KFBS C4F9SO3K Nonafluorobutanesulfonic acid potassium salt 338.19 White powder mp:271℃
EF-N111S-30 (CF3SO2)2NH 30% bis(trifluoromethanesulfonyl)imide aqueous solution 281.14 Colorless liquid -
EF-N115 (CF3SO2)2NLi Lithium bis(trifluoromethanesulfonyl)imide 287.08 White powder mp:232-234℃
EF-N441S-30 (C4F9SO2)2NH 30% bis(nonafluorobutanesulfonyl)imide aqueous solution 581.19 Colorless liquid -


Product name Application
EF-11 Acid catalyst, Raw material for ionic liquid, Synthetic raw material
EF-15 Additive for lithium battery
EF-18 Triflating agents for pharma and agrochemical intermediate, Synthetic raw material
FBSA Acid catalyst, Raw material for ionic liquid and photo-acid-generator(PAG), Synthetic raw material
KFBS Fire retardant for PC resin, Raw material for photo-acid-generator(PAG)
EF-N111S-30 Acid catalyst, Raw material for ionic liquid
EF-N115 Ionic conductive material, Electrolyte, Raw material for ionic liquid
EF-N441S-30 Surfactant, Acid catalyst, Raw material for ionic liquid

■Legal regulation of countries and region

Product name CAS No. Japan China Korea U.S. EU
EF-11 1493-13-6
EF-15 33454-82-9
EF-18 358-23-6 -
FBSA 375-73-5 - - -
KFBS 29420-49-3
EF-N111S-30 82113-65-3 - - -
EF-N115 90076-65-6
EF-N441S-30 39847-39-7 - - - -

Performance Materials Guide